Abstract:
Accurate measurement of MOS transistor inversion capacitance with a physical silicon dioxide thickness less than 20 /spl Aring/ requires correction for the direct tunneli...Show MoreMetadata
Abstract:
Accurate measurement of MOS transistor inversion capacitance with a physical silicon dioxide thickness less than 20 /spl Aring/ requires correction for the direct tunneling leakage. This work presents a capacitance model and extraction based on the application of a lossy transmission line model to the MOS transistor. This approach properly accounts for the leakage current distribution along the channel and produces a gate length dependent correction factor for the measured capacitance that overcomes discrepancies produced through use of previously reported discrete element based models. An extraction technique is presented to determine the oxide's tunneling and channel resistance of the transmission line equivalent circuit. This model is confirmed by producing consistent C/sub 0x/ measurements for several different gate lengths with physical silicon dioxide thickness of 9, 12, and 18 /spl Aring/.
Published in: IEEE Electron Device Letters ( Volume: 21, Issue: 9, September 2000)
DOI: 10.1109/55.863109
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