Channeling effect of low energy boron implant in

Abstract:

Unintentional ion channeling in low energy ion implantation of boron into

Unintentional ion channeling in low energy ion implantation of boron into

Published in: IEEE Electron Device Letters ( Volume: 4, Issue: 3, March 1983)

Page(s): 59 - 62

Date of Publication: 09 August 2005

DOI: 10.1109/EDL.1983.25647

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