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An InGaAs/InAlAs superlattice avalanche photodiode with a gain bandwidth product of 90 GHz | IEEE Journals & Magazine | IEEE Xplore

An InGaAs/InAlAs superlattice avalanche photodiode with a gain bandwidth product of 90 GHz


Abstract:

The authors describe the fabrication of an InGaAs/InAlAs superlattice avalanche photodiode with a gain-bandwidth product of 90 GHz. The device is composed of an InGaAs/In...Show More

Abstract:

The authors describe the fabrication of an InGaAs/InAlAs superlattice avalanche photodiode with a gain-bandwidth product of 90 GHz. The device is composed of an InGaAs/InAlAs superlattice multiplication region and an InGaAs photoabsorption layer. The effect of the superlattice multiplication region thickness on the gain-bandwidth product was studied. A gain-bandwidth product of 90 GHz was obtained for the device with a multiplication region thickness of 0.52 mu m. Low noise performance is compatible with the high gain-bandwidth product due to improvement of the ionization rate ratio made by introducing a superlattice structure into the multiplication region.<>
Published in: IEEE Photonics Technology Letters ( Volume: 3, Issue: 9, September 1991)
Page(s): 815 - 817
Date of Publication: 06 August 2002

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Cites in Papers - |

Cites in Papers - IEEE (6)

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1.
C. H. Tan, J. S. Ng, S. Xie, J. P. R. David, "Potential materials for avalanche photodiodes operating above 10Gb/s", 2009 4th International Conference on Computers and Devices for Communication (CODEC), pp.1-6, 2009.
2.
C.K. Chia, J.P.R. David, G.J. Rees, S.A. Plimmer, M. Hopkinson, R. Grey, P.N. Robson, "Avalanche multiplication in sub-micron Al/sub x/Ga/sub 1-x/As/GaAs heterostructures", Compound Semiconductors 1997. Proceedings of the IEEE Twenty-Fourth International Symposium on Compound Semiconductors, pp.391-394, 1997.
3.
K. Taguchi, "InAlGaAs/InAlAs quaternary well superlattice avalanche photodiodes (APDs)", Proceedings of European Conference on Optical Communication, vol.1, pp.137-144 vol.1, 1996.
4.
T. Kagawa, Y. Kawamura, H. Iwamura, "A wide-bandwidth low-noise InGaAsP-InAlAs superlattice avalanche photodiode with a flip-chip structure for wavelengths of 1.3 and 1.55 mu m", IEEE Journal of Quantum Electronics, vol.29, no.5, pp.1387-1392, 1993.
5.
T. Kagawa, Y. Kawamura, H. Iwamura, "InGaAsP/InAlAs superlattice avalanche photodiode", IEEE Journal of Quantum Electronics, vol.28, no.6, pp.1419-1423, 1992.
6.
C. Rolland, L.E. Tarof, A. Somani, "Multigigabit networks: the challenge", IEEE LTS, vol.3, no.2, pp.16-26, 1992.

Cites in Papers - Other Publishers (8)

1.
Masahiro Kobayashi, Takashi Mikawa, "Avalanche Photodiodes", WDM Technologies, pp.379, 2002.
2.
Yegao Xiao, M. Jamal Deen, F. Javier De la Hidalga-W., "Compound Heterostructure Semiconductor Lasers and Photodetectors", Low Temperature Electronics, pp.647, 2001.
3.
Kevin F. Brennan, Joe Haralson, II, "Invited Review: Superlattice and multiquantum well avalanche photodetectors: physics, concepts and performance", Superlattices and Microstructures, vol.28, no.2, pp.77, 2000.
4.
Bhautik Doshi, Kevin F. Brennan, Robert Bicknell-Tassius, Frank Grunthaner, "The effect of strain-induced polarization fields on impact ionization in a multiquantum-well structure", Applied Physics Letters, vol.73, no.19, pp.2784, 1998.
5.
C.L.F. Ma, M.J. Deen, L.E. Tarof, "Characterization and Modeling of SAGCM InP/InGaAs Avalanche Photodiodes for Multigigabit Optical Fiber Communications", vol.99, pp.65, 1997.
6.
Shoichi Hanatani, Hitoshi Nakamura, Shigehisa Tanaka, Tatemi Ido, Chiaki Notsu, "Flip‐chip lnAlAs/lnGaAs superlattice avalanche photodiodes with back‐illuminated structures", Microwave and Optical Technology Letters, vol.7, no.3, pp.103, 1994.
7.
Toshiaki Kagawa, Yuichi Kawamura, Hidetoshi Iwamura, "Wide-bandwidth avalanche-photodiode receivers", Conference on Optical Fiber Communication/International Conference on Integrated Optics and Optical Fiber Communication, pp.ThG2, 1993.
8.
Eric Tournié, Kalus H. Ploog, "Surfactant-mediated molecular beam epitaxy of strained layer semiconductor heterostructures", Thin Solid Films, vol.231, no.1-2, pp.43, 1993.
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