Contents INTRODUCTION
Micro-mirrors have found a wide range of applications in the past decades, e.g. in projection systems [1], optical scanners [2], optical switches [3] and maskless lithography systems [4] to mention a few examples.
Abstract:
This paper presents a novel CMOS-compatible fabrication process and evaluations of a micro mirror array (MMA) made of mono-crystalline silicon (m-Si) for adaptive optic (...Show MoreMetadata
Abstract:
This paper presents a novel CMOS-compatible fabrication process and evaluations of a micro mirror array (MMA) made of mono-crystalline silicon (m-Si) for adaptive optic (AO) applications. The m-Si mirror layer is transfer bonded from a silicon-on-insulator (SOI) donor wafer with adhesive wafer bonding towards an intermediate patterned polymer spacer layer and clamped with metal plating. We present a CMOS compatible, bond alignment-free fabrication scheme offering the potential for high air gap distances between substrate and mirrors and we show first measurements of the fabricated mirrors.
Date of Conference: 25-29 January 2009
Date Added to IEEE Xplore: 27 March 2009
ISBN Information:
Print ISSN: 1084-6999
