I. Introduction
With the increasing speed of digital communication channels, the input/output (I/O) interface is at higher risk to electrostatic discharge (ESD) due to the thinner gate oxide of the I/O drivers and other FET characteristics. For a 35 nm complementary metal oxide semiconductor technology, the gate oxide film can be as thin as 1.2 nm, making it susceptible to damage from relatively small gate-to-source or gate-to-drain voltages. As logic gates shrink, there is increasing pressure to shrink the size of I/O cells, which means that the energy transferred during an ESD event can easily cause thermal damage to the on-die drivers and associated ESD protection [1].