I. Introduction
Advanced fabrication technology and novel computer architecture promote future chip multiprocessors (CMPs) containing more and more cores with high performance. However, very large leakage current in submicron process and the limitation of current cooling techniques block the beneficial effects of transistor scaling. Especially for emerging portable devices, the usable space for designers is so precious that integrating heat-dissipation device into board becomes very difficult. Dark silicon, which means reducing work frequency of some modules in a chip to avoid overheating of chips, will occupy larger area in future VLSI chips [1]. Another challenge is that with supply voltage scaling, numerous transistors in future chips will work in near threshold voltage region in which even a slight voltage variation might cause error code in data transmission, and so reduce work reliability [2]. Previous work [3] has proved that a microprocessor can be designed with voltage range from 280 mV to 1.2V. It is anticipated that future chips can work in ultra-low voltage with numerous cores. Complicated placement as well as route, and unique power distribution might lead to serious IR drop for future chips, which might amplify the risk of working in near threshold voltage region for future chips.