I. Introduction
The present electronics industry is powered by the constant miniaturization of conventional metal oxide semiconductor (MOS) devices [1], in order to meet the crucial requirements such as low power consumption and high switching speed. However, due to certain technological challenges such as leakage current, uncontrolled tunneling, poor electrostatics integrity, and second-order effects, the performance of the downscaled device deteriorates. To overcome these issues and meet the current demands of the industry, several novel device architecture and methodologies are being adopted, where spintronics [2], [3], [4], [5] seems to be the most promising.