Loading [MathJax]/extensions/MathMenu.js
Superconducting High-Aspect Ratio Through-Silicon Vias With DC-Sputtered Al for Quantum 3D Integration | IEEE Journals & Magazine | IEEE Xplore

Superconducting High-Aspect Ratio Through-Silicon Vias With DC-Sputtered Al for Quantum 3D Integration


Abstract:

This paper presents the fabrication and electrical characterization of superconducting high-aspect ratio through-silicon vias DC-sputtered with aluminum. Fully conformal ...Show More

Abstract:

This paper presents the fabrication and electrical characterization of superconducting high-aspect ratio through-silicon vias DC-sputtered with aluminum. Fully conformal and void-free coating of 300 μm-deep and 50 μm-wide vias with Al, a CMOS-compatible and widely available superconductor, was made possible by tailoring a funneled sidewall profile for the axisymmetric vias. Single-via electric resistance as low as 80.44 mQ at room temperature and superconductivity below 1.28 K were measured by a cross-bridge Kelvin resistor structure. This work thus demonstrates the fabrication of functional superconducting interposer layers, suitable for high-density 3D integration of silicon-based quantum computing architectures.
Published in: IEEE Electron Device Letters ( Volume: 41, Issue: 7, July 2020)
Page(s): 1114 - 1117
Date of Publication: 14 May 2020

ISSN Information:

Funding Agency:


I. Introduction

Quantum technology has made remarkable progress in the last two decades [1]. Among quantum technology’s four main areas—which also include communication, simulation, and sensing and metrology—quantum computation is gaining particular relevance. In this respect, increasing interest has been recently directed to the possibility of using through-silicon vias (TSVs) at cryogenic temperatures [2]. Such interest was boosted by the demonstration of silicon-based quantum computers, which need to operate at temperatures lower than 1 K [3]. The quest for superconducting vias arises from the realization that the number of physical qubits required for the control and error-correction of logical qubits is nowadays a limitation to compete with the performance of classical computers [1]. Actually, several millions of physical qubits should be integrated on an single chip to achieve substantially higher performance [4]. Current implementations of superconducting and spin qubits in silicon require an area orders of magnitude larger than the size of typical MOS transistors [3]. This severely limits qubit integration density in a single substrate. High qubit integration densities therefore require multilayer technologies, and 3D superconducting interconnects may suit the purpose (Fig. 1): they allow to get rid of interconnecting wires, freeing chip surface to increase qubit density, as well as to vertically stack and interconnect multiple chips [5].

Sketch of the proposed 3D integration concept for large-scale high-density quantum computing, including a qubit-based layer, TSV-based superconducting interconnects in an interposer layer, and the CMOS circuitry for the control and readout of the qubits.

Contact IEEE to Subscribe

References

References is not available for this document.