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Indium Phosphide Membrane Photonics on Silicon | IEEE Conference Publication | IEEE Xplore

Abstract:

Energy-efficiency, bandwidth density and speed requirements drive miniaturisation in photonics and the intimate integration with silicon technologies. IMOS - the integrat...Show More

Abstract:

Energy-efficiency, bandwidth density and speed requirements drive miniaturisation in photonics and the intimate integration with silicon technologies. IMOS - the integration of InP membranes on silicon - is an active, scalable nanophotonic platform to achieve this.
Date of Conference: 03-07 March 2019
Date Added to IEEE Xplore: 25 April 2019
ISBN Information:
Conference Location: San Diego, CA, USA

1. Indium Phosphide Integrated Nanophotonic Platform

Indium phosphide (InP) underpins a range of nanophotonic platforms which include lasers and amplifiers. InP integrated nanophotonics offers a natural step in miniaturisation for a wide range of InP photonic integrated circuits (PICs) [1]–[7] with its high-efficiency optoelectronic processes. The InP membrane on silicon (IMOS) [8], [9] platform presented in this work offers the integration of active and passive building blocks, such as lasers, detectors and high-index-contrast waveguide devices, monolithically in a single micron-thick membrane layer on silicon with submicron waveguide layer. The use of a wafer-level approach avoids die-level assembly steps and multiple elements are integrated within the same epitaxial wafer. Optical interfaces between separately-processed wafers are removed, providing a powerful route to nanoscale miniaturisation and circuit level yield-performance improvements in a scaleable process. Using a silicon substrate enables a route to further integration with electronics and efficient heatsinking.

Platform approach for the integration of active and passive components in one inp membrane on silicon (IMOS)

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