I. Introduction
GaN-based materials are very promising semiconductors for power switching devices taking advantages of the superior material properties such as higher breakdown field and higher sheet carrier density of two dimensional electron gas (2DEG) at hetero interface between AlGaN/GaN. Although higher sheet carrier density of 2DEG is attractive to decrease channel resistance of GaN-based transistors, normally-off operation of the transistors is difficult. Thus much effort has been devoted to achieve GaN-based transistors with normally-off operation together with decreasing channel resistance and increasing breakdown voltage. GaN-based Gate Injection Transistor (GIT) with p-type gate on AlGaN/GaN hetero structure is a solution to overcome them.