Method for implementation of active stabilization the spatial position of mechatronic device rotor

The paper is devoted to the development and the research of technical solutions centering problem of the spatial position of the mechatronic device rotor used in high-precision processing systems. The existing and widely used methods of eliminating unbalances at present are considered. A new approach to solving the problem of stabilizing the rotating element of the mechatronic device is offered, based on the active current updating of the spatial position. Methods of sputtering of single-component metallic layer on the rotating element of the mechatronic device used in the production are considered. It is presented the results of the simulation, confirming the efficiency of the proposed approach.

I. Introduction

By the definition, mechatronic device combines a number of components: mechanical, electrical, electronic, and intellectual (computer) parts [1]. They are all integrated in a common module and coherently interact with each other, and their work is subjected to one common task. Thus, the development of any field of engineering separately, inevitably reflected in mechatronics.