Abstract:
A description is given of the development of a novel single-wafer multiprocessing reactor for flexible VLSI manufacturing that combines lamp heating, remote microwave pla...Show MoreMetadata
Abstract:
A description is given of the development of a novel single-wafer multiprocessing reactor for flexible VLSI manufacturing that combines lamp heating, remote microwave plasma processing, and photo processing in a single cold-wall chamber for multilayer in-situ growth and deposition of dielectrics, semiconductors, and metals. Three examples of multiprocessing technology are discussed: low-temperature growth of ultrathin dielectrics, selective and nonselective chemical vapor deposition of tungsten, and epitaxial growth of silicon and silicon-germanium alloys.<>
Date of Conference: 17-19 May 1989
Date Added to IEEE Xplore: 06 August 2002
