Abstract:
We proposed a novel wafer level chip scale package in which Laser Lift Off (LLO) was adopted for substrate removal. We confirmed that the LLO did not cause both mechanica...Show MoreMetadata
Abstract:
We proposed a novel wafer level chip scale package in which Laser Lift Off (LLO) was adopted for substrate removal. We confirmed that the LLO did not cause both mechanical and thermal damages into GaN layer.
Published in: 2013 3rd IEEE CPMT Symposium Japan
Date of Conference: 11-13 November 2013
Date Added to IEEE Xplore: 06 March 2014
ISBN Information:
Print ISSN: 2373-5449