Abstract:
Summary form only given, as follows. In our experiments a discharge gas is formed between the thermionic cathode and water-cooled anode. Al, Cu, Ni, Cr, Ti, Ta, Mo, B, C,...Show MoreMetadata
Abstract:
Summary form only given, as follows. In our experiments a discharge gas is formed between the thermionic cathode and water-cooled anode. Al, Cu, Ni, Cr, Ti, Ta, Mo, B, C, W are embedded on the anode as a working substance. Using the cylindrical electrode and electromagnetic system there is the possibility for creating transverse electric and magnetic fields. It is shown that the plasma-flow ionization coefficient may reach the value up to 80%. Thus the data presented in this paper (high ionization coefficient, charge-compensated plasma flow) demonstrate the perspective of wide practical utilization of such type of discharge for creation of thin high-adhesive films.
Published in: IEEE Conference Record - Abstracts. 1997 IEEE International Conference on Plasma Science
Date of Conference: 19-22 May 1997
Date Added to IEEE Xplore: 06 August 2002
Print ISBN:0-7803-3990-8
Print ISSN: 0730-9244
