Abstract:
Summary form only given. Experiments are ongoing on the PBFA-II accelerator to optimize an active lithium ion source in a 15-cm focusing applied-B ion diode using the LEV...Show MoreMetadata
Abstract:
Summary form only given. Experiments are ongoing on the PBFA-II accelerator to optimize an active lithium ion source in a 15-cm focusing applied-B ion diode using the LEVIS (Laser Evaporation Ion Source) process. Spectroscopic observations indicate the presence of a preformed anode plasma prior to the power pulse. However, the time between application of high voltage and the initiation of significant ion current on the LEVIS diode is roughly comparable to that seen with a passive diode using LiF as the ion source. This is consistent with time-dependent diode modeling, which shows that both LEVIS and LiF are achieving enhanced diode current within a few nsec of the expected time determined from ideal diode theory. The LEVIS-generated beam has attained focal spot sizes of 6-8 mm (horizontal focusing), comparable to that seen with the LiF source operated with similar parameters. There are preliminary indications that diodes with the LEVIS source experience less impedance decay for comparable ion beam currents than those with the LiF source.
Published in: International Conference on Plasma Sciences (ICOPS)
Date of Conference: 07-09 June 1993
Date Added to IEEE Xplore: 06 August 2002
Print ISBN:0-7803-1360-7
Print ISSN: 0730-9244
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1.
M.E. Cuneo, "The effect of electrode contamination, cleaning and conditioning on high-energy pulsed-power device performance", IEEE Transactions on Dielectrics and Electrical Insulation, vol.6, no.4, pp.469-485, 1999.
2.
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3.
M.E. Cuneo, P.R. Menge, D.L. Hanson, W.E. Fowler, M.A. Bernard, G.R. Ziska, A.B. Filuk, T.D. Pointon, R.A. Vesey, D.R. Welch, J.E. Bailey, M.P. Desjarlais, T.R. Lockner, T.A. Mehlhorn, S.A. Slutz, M.A. Stark, "Results of vacuum cleaning techniques on the performance of LiF field-threshold ion sources on extraction applied-B ion diodes at 1-10 TW", IEEE Transactions on Plasma Science, vol.25, no.2, pp.229-251, 1997.
