Abstract:
Three-step selective-area metal-organic chemical vapor deposition (MOCVD) is used to fabricate a dual wavelength InGaAs-GaAs-AlGaAs quantum well laser source with integra...Show MoreMetadata
Abstract:
Three-step selective-area metal-organic chemical vapor deposition (MOCVD) is used to fabricate a dual wavelength InGaAs-GaAs-AlGaAs quantum well laser source with integrated electroabsorption modulators and a passive Y-junction coupler. Threshold current values of 9.5 and 10.1 mA are obtained for two distinct wavelength sources operating continuous-wave (CW) coupled into the same output waveguide.
Published in: IEEE Photonics Technology Letters ( Volume: 9, Issue: 2, February 1997)
DOI: 10.1109/68.553073