Abstract:
MOS surface mobility is a fundamental material and device property which has been extensively studied both theoretically and experimentally. This work reports on a new te...Show MoreMetadata
Abstract:
MOS surface mobility is a fundamental material and device property which has been extensively studied both theoretically and experimentally. This work reports on a new technique for extracting surface mobility data from experimentally measured I-V data on large area MOS devices. The approach employs a least squares curve fitting technique for combining theoretical models of inversion layer charge and surface mobility to obtain an accurate value of surface threshold voltage. An accurate model of inversion layer charge is then used to calculate the experimental mobility. The extraction technique gives high field values of mobility which compare very closely with previously reported extraction approaches but gives more accurate low field values due to an improved model for inversion layer charge. A very important feature of the technique is the ability to obtain data on individual components of surface scattering such as interface scattering density and surface roughness coefficient. These individual parameters are very valuable when comparing the effects of changes in surface preparation techniques on MOS surface mobility.
Published in: IEEE Transactions on Electron Devices ( Volume: 43, Issue: 11, November 1996)
DOI: 10.1109/16.543036
Citations are not available for this document.
Cites in Patents (1)Patent Links Provided by 1790 Analytics
1.
Bu, Jiankang; Belcher, William S., "SYSTEM AND METHOD FOR DETERMINING SUBSTRATE DOPING DENSITY IN METAL OXIDE SEMICONDUCTOR DEVICES"
Inventors:
Bu, Jiankang; Belcher, William S.
Abstract:
A system and method are disclosed for very accurately determining a value of a substrate doping density in a metal oxide semiconductor device. A plurality of values of threshold voltage of a device under test are measured using a plurality of different values of source to substrate bias voltage. Then a linear relationship is determined between the plurality of values of threshold voltage and a plurality of different values of an expression that is a function of the source to substrate bias voltage and a function of a surface potential of the device. A very accurate value of the substrate doping density is reiteratively calculated from the linear relationship without assuming that the surface potential of the device has a constant value.
Assignee:
NATIONAL SEMICONDUCTOR CORP
Filing Date:
20 December 2006
Grant Date:
31 March 2009
Patent Classes:
Current U.S. Class:
702023000, 702137000
Current International Class:
G01N0310000, G01N0093600, G06F0190000, G06F0150000