Effect of Intensified Emission During the Generation of a Submillisecond Low-Energy Electron Beam in a Plasma-Cathode Diode | IEEE Journals & Magazine | IEEE Xplore

Effect of Intensified Emission During the Generation of a Submillisecond Low-Energy Electron Beam in a Plasma-Cathode Diode


Abstract:

The effect of the intensification of electron emission in a plasma-cathode diode with a grid-stabilized plasma boundary has been investigated. For a pulsed (100-mus) elec...Show More

Abstract:

The effect of the intensification of electron emission in a plasma-cathode diode with a grid-stabilized plasma boundary has been investigated. For a pulsed (100-mus) electron beam of 15-20-keV energy that passes through the plasma formed as a result of gas ionization by an electron beam, it has been revealed that an increase in pressure increases the emission current at a fixed plasma-cathode discharge current, and the emission current can become greater in magnitude than the discharge current. It has been shown that a significant increase in electron-beam current is provided by the secondary ion-electron emission that results from the bombardment of the emission electrode surface by the accelerated ions coming from the boundary of the anode plasma.
Published in: IEEE Transactions on Plasma Science ( Volume: 37, Issue: 10, October 2009)
Page(s): 1890 - 1896
Date of Publication: 23 June 2009

ISSN Information:


I. Introduction

The technological application of high-power pulsed electron beams to surface modification of metal and cermet materials and products is progressing rapidly [1]–[4]. Low-energy (up to 30 keV) high-current electron beams whose energy density ranges from a few to hundreds of joules per square centimeter at microsecond and submillisecond pulse durations are particularly promising. The action of beams of this type on metal materials in vacuum results in melting of the surface, in its smoothing by surface tension forces, and in structural modification of the surface layer for a depth from several micrometers to tens of micrometers. Electron sources with a grid plasma cathode [5], [6] have well-known advantages such as long lifetime, high energy efficiency, and high uniform current density at a rather large emission surface (up to 100 ). They also feature the possibility for smooth and independent tuning of the beam main parameters over a wide range and the capability of producing beams of long current pulse duration at high repetition rates (up to 1 kHz). In many cases, electron sources of this type are favored in technologies of pulsed thermal surface treatment of materials and products. To improve the performance of currently available plasma-cathode electron-beam sources and to design and manufacture new ones, investigations on the beam generation and transport in gas-filled gaps are necessary.

References

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