Fabrication of Large Size Photonic Crystal Templates by Holographic Lithography Technique

Multi-exposure two-beam interference technique was employed to fabricate large size defect-free 2D and 3D polymer photonic crystal (PhC) templates. Combining with a double-step laser scanning technique, designed defects could be precisely embedded to a 2D PhC template.

1 INTRODUCTION

Recently, there has been considerable interest in the fabrication of two-and three-dimensional (2D and 3D) photonic crystals (PhCs), which consist of periodic dielectric structures [1]. Holography lithography (HL) technique is a very promising and inexpensive technique to fabricate large size and defect-free PhC templates. In this work we demonstrated that multi-exposure two-beam interference technique [2] is an efficient way to fabricate defect-free 2D and 3D PhC templates. In combining this technique with mask-lithography, we created arbitrary and long-range defects into uniform and large-area 2D PhC templates [3]. Moreover, adopting a double-step laser scanning technique, designed defects could be precisely embedded to a 2D PhC template r [4].