1 Introduction
Using high refractive index contrast materials is the route towards ultra-dense photonic integrated circuits. The last few years, a lot of very compact components were demonstrated in Silicon-on-Insulator (SOl) [1]. For this high-index contrast material system, CMOS-fabrication processes can be used, allowing for volume fabrication. An important problem remains the interface with the outside world. The large difference in mode-size between a singlemode optical fiber and nanophotonic on-chip waveguides results in large coupling losses and high packaging costs.