Abstract:
Emission microscopy is introduced as a new technique for semiconductor failure analysis. Very faint photo-emission is observed where various abnormal condition is arising...Show MoreMetadata
Abstract:
Emission microscopy is introduced as a new technique for semiconductor failure analysis. Very faint photo-emission is observed where various abnormal condition is arising. To find exact location of the failure site is a key to improve the design and production yield of the device. Emission microscope and it's application is described with practical analysis results.<>
Date of Conference: 10-12 May 1994
Date Added to IEEE Xplore: 06 August 2002
Print ISBN:0-7803-1880-3
