Abstract:
An analytical model for the subthreshold regime of operation of short-channel MOSFETs is presented, and expressions for the threshold-voltage shift associated with the dr...Show MoreMetadata
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Abstract:
An analytical model for the subthreshold regime of operation of short-channel MOSFETs is presented, and expressions for the threshold-voltage shift associated with the drain-induced barrier lowering (DIBL) caused by the application of a drain bias are developed. The amount of drain-bias-induced depletion charge in the channel is estimated, and an expression for the distribution of this charge along the channel is developed. From this distribution, it is possible to find the lowering of the potential barrier between the source and the channel, and the corresponding threshold-voltage shift. The results are compared with experimental data for deep-submicrometer NMOS devices. Expressions for the subthreshold current and for a generalized unified charge control model (UCCM) for short-channel MOSFETs are presented. The theory is applicable to deep-submicrometer devices with gate lengths larger than 0.1 mu m. The model is suitable for implementation in circuit simulators.<>
Published in: IEEE Transactions on Electron Devices ( Volume: 40, Issue: 1, January 1993)
DOI: 10.1109/16.249436
First Page of the Article
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