I. Introduction
Micro (nano) photonics is a promising candidate to overcome limitations of micro(nano) electronics, particularly those concerning speed of processing and transmission of information on a chip. The use of a proper photonic material is essential for microphotonic circuits to be commercially competitive. Silicon is transparent in the range of optical telecommunications wavelengths (1.3 and 1.55 ) and has a high-refractive index, which permits the miniaturization of photonic devices [1]. In addition, Si-based materials are process compatible with standard fabrication techniques (bipolar or complementary metal–oxide–semiconductor (CMOS) technology), which facilitates the fabrication and commercialization of Si-based integrated optoelectronic circuits. For this purpose, Si-on-insulator (SOI) substrates provide an excellent platform. The use of crystalline Si (c-Si) instead of polysilicon (poly-Si) or amorphous Si for light guiding reduces scattering and absorption losses [2]. Besides, the importance of SOI is increasing in the microelectronics field for high-speed and low-power applications [3], making it ideal for the simultaneous integration of electronic and photonic components on the same chip.