COMPOSITE—A complete modeling program of silicon technology

A new two-dimensional process modeling program written in Fortran is described. For the first time, this program allows the simulation of all important processing steps occuring in typical sequences involved in the fabrication of integrated circuits such as doping, oxidation, lithography, etching, and layer deposition. The program possesses a modular structure to allow for easy changing and improvement of process models as well as of mathematical procedures. The program is menu driven to make it easy to use for non-experts and it is readily usable with different computer systems.