Abstract:
The most promising electroluminescent materials used for visible light emitting diodes (LEDs) are GaAsP, GaAlAs, GaP, and GaAs with phosphors. Presently, GaAsP, which is ...Show MoreMetadata
Abstract:
The most promising electroluminescent materials used for visible light emitting diodes (LEDs) are GaAsP, GaAlAs, GaP, and GaAs with phosphors. Presently, GaAsP, which is prepared by vapor phase epitaxy, is the only material which has found widespread commercial use. In this work an effort was made to explore the feasibility of fabricating planar monolithic GaAlAs LED arrays prepared by the liquid phase epitaxial (LPE) process. In order to accomplish this objective the LPE process was developed so that epitaxial layers of uniform thickness and essentially constant composition with smooth photoprocessable surfaces could be reproducibly grown at a reasonable cost. Through the use of special fixturing and proper adjustment of thermal gradients during the LPE growth, epitaxial layers of suitable quality were produced which were used to fabricate planar monolithic structures. A description will be given the preparation and processing of these structures. The electrical properties of the GaAlAs epitaxial layers and the electrical and optical characteristics of the planar monolithic structures fabricated will be discussed. The LPE process which has evolved in the growth of GaAlAs layers also has applicability for the LPE growth of GaP or amphoteric doped GaAs both of which have produced high efficiency LEDs so far by the LPE process only.
Published in: Proceedings of the IEEE ( Volume: 59, Issue: 10, October 1971)
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Cites in Papers - |
Cites in Papers - IEEE (3)
Select All
1.
R.N. Bhargava, "Recent advances in visible LED'S", IEEE Transactions on Electron Devices, vol.22, no.9, pp.691-701, 1975.
2.
J. Blum, J. McGroddy, P. McMullin, K. Shih, A. Smith, J. Ziegler, "Oxygen-implanted double-heterojunction GaAs/GaAlAs injection lasers", IEEE Journal of Quantum Electronics, vol.11, no.7, pp.413-418, 1975.
3.
C. J. Nuese, H. Kressel, I. Ladany, "The future for LEDs", IEEE Spectrum, vol.9, no.5, pp.28-38, 1972.
Cites in Papers - Other Publishers (26)
1.
Ashok K. Saxena, "Electrical Transport Properties of GaAs and Alas Mixed Crystals for Semiconductor Devices", IETE Journal of Research, vol.29, no.3, pp.97, 1983.
2.
Ashok K. Saxena, K.S. Gurumurthy, "Scattering parameters from an analysis of the hall electron mobility in Ga1−xAlxAs alloys", Journal of Physics and Chemistry of Solids, vol.43, no.9, pp.801, 1982.
3.
Ashok K. Saxena, "Electron mobility inGa1−xAlxAsalloys", Physical Review B, vol.24, no.6, pp.3295, 1981.
4.
Günter Winstel, Claus Weyrich, "Lumineszenzdioden", Optoelektronik I, vol.10, pp.132, 1981.
5.
ASHOK K. SAXENA, "The conduction band structure of Ga1−xAlxAs alloys from Hall mobility measurements at high pressures", International Journal of Electronics, vol.51, no.6, pp.779, 1981.
6.
Hans J. Scheel, "A new technique for multilayer LPE", Journal of Crystal Growth, vol.42, pp.301, 1977.
7.
HENRY KRESSEL, J.K. BUTLER, "Devices for Special Applications", Semiconductor Lasers and Herterojunction Leds, pp.455, 1977.
8.
A. Doi, T. Asano, M. Migitaka, "Epitaxial growth of GaAs from thin Ga solution", Journal of Applied Physics, vol.47, no.4, pp.1589, 1976.
9.
R. Hammer, N. J. Chou, J. M. Eldridge, "An internal calibration technique for pseudobinary systems by auger electron spectroscopy", Journal of Electronic Materials, vol.5, no.6, pp.557, 1976.
10.
G. R. Woolhouse, A. E. Blakeslee, K. K. Shih, "Detection and origins of crystal defects in GaAs/GaAlAs LPE layers", Journal of Applied Physics, vol.47, no.10, pp.4349, 1976.
11.
Herbert F. Mataré, "Light-Emitting Devices, Part I: Methods", vol.42, pp.179, 1976.
12.
Satoshi Komiya, Kenzo Akita, Yorimitsu Nishitani, Shouji Isozumi, Tsuyoshi Kotani, "Etch pits and dislocations of Ga1−xAlxAs liquid phase epitaxial layers", Journal of Applied Physics, vol.47, no.7, pp.3367, 1976.
13.
Kh. B. Zembatov, Yu. B. Bolkhovityanov, "Growth of AlxGa1?xAs films of controllable thickness from a thin layer of molten solution", Soviet Physics Journal, vol.18, no.8, pp.1183, 1975.
14.
A. F. Kravchenko, Yu. E. Maronchuk, N. A. Yakusheva, "Investigation of the hall coefficient in epitaxial layers of AlxGa1–xAs solid solutions doped with tellurium", Physica Status Solidi (a), vol.30, no.2, pp.543, 1975.
15.
E.A. Giess, R. Ghez, "Liquid-Phase Epitaxy", Epitaxial Growth, pp.183, 1975.
16.
W. A. Gutierrez, H. L. Wilson, E. M. Yee, "GaAs transmission photocathode grown by hybrid epitaxy", Applied Physics Letters, vol.25, no.9, pp.482, 1974.
17.
E. Bauser, M. Frik, K.S. Loechner, L. Schmidt, R. Ulrich, "Substrate orientation and surface morphology of GaAs liquid phase epitaxial layers", Journal of Crystal Growth, vol.27, pp.148, 1974.
18.
H.T. Minden, R. Premo, C.V. Collins, "The effect of germanium on the distribution coefficient of aluminium in the system solid AlxGa1−xAs liquid Ga−Al−As−Ge", Journal of Crystal Growth, vol.27, pp.316, 1974.
19.
M.B. Small, I. Crossley, "The physical processes occurring during liquid phase epitaxial growth", Journal of Crystal Growth, vol.27, pp.35, 1974.
20.
H. Neumann, U. Flohrer, "Electron mobility in Alx Ga1−x As", Physica Status Solidi (a), vol.25, no.2, pp.K145, 1974.
21.
H. Kressel, H. Nelson, "Properties and Applications of III–V Compound Films Deposited by Liquid Phase Epitaxy", Physics of Thin Films - Advances in Research and Development, vol.7, pp.115, 1973.
22.
T.G.J. Van Oirschot, W. Nijman, "Improved boat for multiple-bin liquid phase epitaxy", Journal of Crystal Growth, vol.20, no.4, pp.301, 1973.
23.
I. Crossley, M.B. Small, "Some observations of the surface morphologies of GaAs layers grown by liquid phase epitaxy", Journal of Crystal Growth, vol.19, no.3, pp.160, 1973.
24.
H. Neumann, U. Flohrer, W. Hörig, "Electrical properties of n-type AlxGa1–xAs single crystals", Physica Status Solidi (a), vol.16, no.1, pp.81, 1973.
25.
K. K. Shih, J. M. Blum, "AlxGa1−xAs Grown‐Diffused Electroluminescent Planar Monolithic Diodes", Journal of Applied Physics, vol.43, no.7, pp.3094, 1972.
26.
H.F. Lockwood, M. Ettenberg, "Thin solution multiple layer epitaxy", Journal of Crystal Growth, vol.15, no.1, pp.81, 1972.