I. Introduction
Near-field measurement has been widely adopted in electromagnetic emission testing and diagnosis [1], [2], [3]. Near-field magnetic probes are measurement components suitable for conducting noncontact near-field measurements and are capable of capturing radiated field distributions of small structures, e.g., component pins, bypass capacitors, chip packages, etc. [4], [5], [6]. To accurately measure these microstructures, the spatial resolution of the probe is a critical parameter. If the probe’s spatial resolution exceeds the distance between two amplitude peaks of the spatial field, the probe could be insensitive to changes in the electromagnetic field within this range, resulting in inaccurate measurement results [7]. As the dimensions of structures within integrated circuits continue to shrink, magnetic probe design is evolving to achieve higher spatial resolution to distinguish electromagnetic radiation from miniature structures [8], [9]. Universal methods to accurately assess the spatial resolution of a given near-field magnetic probe, however, have not been investigated extensively.