Abstract:
The heat transfer to a wafer in a rapid thermal processing (RTP) furnace is simulated by an analytical/numerical model. The model includes radiation heat transfer to the ...Show MoreMetadata
Abstract:
The heat transfer to a wafer in a rapid thermal processing (RTP) furnace is simulated by an analytical/numerical model. The model includes radiation heat transfer to the wafer from the lamps, heat conduction within the wafer, and emission of radiation from the wafer. Geometric optics are used to predict the radiant heat flux distribution over the wafer. The predicted wafer surface temperature distribution is compared to measurements made in an RTP furnace for two different reflector geometries. Lamp configurations and the resulting irradiance required to produce a uniform wafer temperature are defined.<>
Published in: IEEE Transactions on Electron Devices ( Volume: 39, Issue: 1, January 1992)
DOI: 10.1109/16.108214
Keywords assist with retrieval of results and provide a means to discovering other relevant content. Learn more.
- IEEE Keywords
- Index Terms
- Uniform Temperature ,
- Rapid Thermal Processing ,
- Emission Spectra ,
- Heat Transfer ,
- Thermal Conductivity ,
- Heat Flux ,
- Temperature Distribution ,
- Spectral Power ,
- Thermal Radiation ,
- PhD Degree ,
- Nuclear Technology ,
- Geometrical Optics ,
- Wafer Surface ,
- Heat Flux Distribution ,
- Reaction Rate ,
- Film Thickness ,
- Gas Flow ,
- Perimeter ,
- Temperature Gradient ,
- Increase In Radiation ,
- Radial Temperature ,
- Low-pressure Chemical Vapor Deposition ,
- Radial Gradient ,
- Heat Equation ,
- Lamp Irradiation ,
- Function Of Radius ,
- Thick Wafer ,
- Chemical Vapor Deposition ,
- Number Of Approaches
Keywords assist with retrieval of results and provide a means to discovering other relevant content. Learn more.
- IEEE Keywords
- Index Terms
- Uniform Temperature ,
- Rapid Thermal Processing ,
- Emission Spectra ,
- Heat Transfer ,
- Thermal Conductivity ,
- Heat Flux ,
- Temperature Distribution ,
- Spectral Power ,
- Thermal Radiation ,
- PhD Degree ,
- Nuclear Technology ,
- Geometrical Optics ,
- Wafer Surface ,
- Heat Flux Distribution ,
- Reaction Rate ,
- Film Thickness ,
- Gas Flow ,
- Perimeter ,
- Temperature Gradient ,
- Increase In Radiation ,
- Radial Temperature ,
- Low-pressure Chemical Vapor Deposition ,
- Radial Gradient ,
- Heat Equation ,
- Lamp Irradiation ,
- Function Of Radius ,
- Thick Wafer ,
- Chemical Vapor Deposition ,
- Number Of Approaches
