I. Introduction
The advancement of ultra-precision manufacturing and contemporary industrial production technology has prompted a pressing demand for high-precision and high-sensitivity micro-displacement detection. Capacitive displacement sensing technology not only features non-contact sensing but also offers advantages such as compact size, high cost-effectiveness, heightened sensitivity, and excellent dynamic response. However, the background capacitance of micro-capacitance sensors mostly falls within the femtofarad (fF) range, resulting in a capacitance change corresponding to nanoscale displacement changes being in the zeptofarad (zF) range only. This small capacitance change can easily be overwhelmed by parasitic capacitance in cables and detection circuits, thereby complicating detection. Therefore, enhancing the signal-to-noise ratio of micro-capacitance detection presents a fundamental challenge that needs to be addressed [1].