I. Introduction
With the development of space technology and semiconductor technology, the analysis of material surface characteristics is of tremendous significance [1]–[2]. An ultraviolet electron spectrum analyzer is an instrument to solve this problem. The vacuum ultraviolet monochromator, which serves as the core component of this analyzer, provides a high-resolution ultraviolet monochromatic light source that can be adjusted continuously for testing purposes. However, the efficiency of the existing vacuum ultraviolet monochromator is often quite low, which dramatically limits the test efficiency and signal-to-noise ratio.