I. Introduction
Characterization and localization for electromagnetic interference (EMI) is becoming more troublesome [1]. The near-filed scanning, as a conventional EMI diagnosis technique, is widely utilized to localize the radiation source close to product surface [2]. However, the miniaturization of near-field probe has struggled to keep pace with the growing component density and circuit layout, thereby hindering the improvement on measurement accuracy [3]. Furthermore, the electromagnetic field in the vicinity of the device surface is often dominated by evanescent waves that does not correlate to the near-field or far-field [4]. To overcome above limitations, emission source microscopy (ESM) is presented [5]. ESM is supposed to directly measure the far-field of emission source and then back-propagate to the near-field image on the source surface. Since ESM technique performs two phase-synchronized field measurement and then applies synthetic aperture radar (SAR) algorithm for back-propagation to source surface plane. This endows ESM the potential to realize high-resolution microscopy regardless of probe size or evanescent waves [5]. Related techniques also have been used for imaging to detect microwave concealed sources or aerial imaging [6].