Self aligned BM for VLSI using a new diffusion technique for shallow base formation

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First Page of the Article

Published in: 51st Annual Device Research Conference

Date of Conference: 21-23 June 1993

Date Added to IEEE Xplore: 06 August 2002

DOI: 10.1109/DRC.1993.1009562

Conference Location: Santa Barbara, CA, USA

First Page of the Article

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