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A. Viviani - IEEE Xplore Author Profile

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The electrical characteristics of devices and circuits realized in CMOS technology on silicon-on-insulator (SOI) substrates and operated at elevated temperatures are presented and compared with results obtained using other materials (bulk Si, GaAs, SiC). It is demonstrated that fully depleted CMOS on SOI is the most suitable process for the realization of complex electronic circuits to be operated...Show More
This paper presents the latest results of our research on SOI (Silicon-On-Insulator) technology for high temperature electronics. We focus on Fully-Depleted SOI (FD-SOI) because it achieves superior high temperature results compared with Partially Depleted (PD-SOI) technology. Our interest includes both technology considerations and circuit studies. We show that FD-SOI is an efficient way to imple...Show More
Special techniques are presented for the design of SOI CMOS OTAs which have to operate from room up to very high ambient temperatures. The results of several implementations are reported including applications such as in bandgap and current references as well as Σ-Δ modulators with efficient switch design at elevated temperatures.Show More
The feasibility of single chip solutions fully integrating complete analog instrumentation system using thin-film fully-depleted SOI CMOS technology is demonstrated. The performance of our instrumentation amplifiers, continuous-time filters and sigma-delta modulators are compatible with actual specifications from oil drilling or aerospace applications and correct operation is extended up to more t...Show More
A systematic study of the gain-boosted regulated-cascode operational transconductance amplifier (OTA) CMOS stage is presented. Symbolic analysis is used first to describe the pole-zero behaviour and second to propose design criteria for optimal settling time. A synthesis procedure based on the "gm/ID" methodology is considered further on for quick optimization of the architecture based on the dc o...Show More
This work analyzes both by simulations and measurements the substrate crosstalk performances of various Silicon-On-Insulator (SOI) technologies, and compares them to those of normal bulk CMOS process. The influence of various parameters, such as substrate resistivity, buried oxide thickness and distance between devices, is investigated. The use of capacitive guard rings is proposed, and their effe...Show More
The low-power and high-temperature potentials of SOI have been used to design a /spl Sigma//spl Delta/ modulator that achieves performances hard to obtain in bulk technology. From this first study, we estimate that further improvements based on the use of a technology with lower transistor size and lower threshold voltage, together with higher-order loop filters and higher OSR could boost the prec...Show More
This work analyzes crosstalk phenomena in SOI-SIMOX substrates by means of two-dimensional device simulations and measurements on test structures. The influence of the substrate resistivity and of guard rings is studied. The results are compared with those obtained for standard CMOS technology. A significant crosstalk reduction, up to 10 GHz, is obtained with high-resistivity substrates. A simple ...
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