Author details
Author's Published Works
Author details
Showing 1-3 of 3 results
- Sort
Filter Results
Show
Sort By
Results
Rapid and Accurate Thin Film Thickness Extraction via UV-Vis and Machine Learning
Siyu Isaac Parker Tian;Zhe Liu;Vijila Chellappan;Yee-Fun Lim;Zekun Ren;Felipe Oviedo;B. Heng Teo;Janak Thapa;Rajdeep Dutta;Benjamin P MacLeod;Fraser G. L. Parlane;J. Senthilnath;Curtis P. Berlinguette;Tonio Buonassisi
2020 47th IEEE Photovoltaic Specialists Conference (PVSC)
Year: 2020 | Conference Paper |
Cited by: Papers (4)
Thin-film processes are ubiquitous in photovoltaics research and are increasingly incorporated into high-throughput experimentation (HTE) equipment. However, HTE is limited by the slowest steps, and accurate thickness measurements have emerged as a bottleneck. This study demonstrates rapid yet accurate thin-film thickness extraction by leveraging machine learning (ML) in combination with non-destr...Show More
Rapid and Accurate Thin Film Thickness Extraction via UV-Vis and Machine Learning
Siyu Isaac Parker Tian;Zhe Liu;Vijila Chellappan;Yee-Fun Lim;Zekun Ren;Felipe Oviedo;B. Heng Teo;Janak Thapa;Rajdeep Dutta;Benjamin P MacLeod;Fraser G. L. Parlane;J. Senthilnath;Curtis P. Berlinguette;Tonio Buonassisi
Year: 2020 | Conference Paper |
Improved Screen-Printed Cu Metallisation for Passivated Contact Solar Cells
Boon Heng Teo;Ankit Khanna;Vinodh Shanmugam;Gabby Alonso De Luna;Rowel Vigare Tabajonda;Jennifer Jordan Epistola;Wei-Chen Chang;Thomas Mueller
2020 47th IEEE Photovoltaic Specialists Conference (PVSC)
Year: 2020 | Conference Paper |
This abstract reports the first results regarding the development of screen-printed curing type Cu paste suitable for low and high temperature passivated contact solar cells. Cu nanoparticles were encapsulated with a thin layer of polyvinylpyrrolidone (< 5 nm) and screen printed on Indium-Tin oxide (ITO). The screen-printed samples were cured under vacuum conditions (< 300 ppm O2) at a range of cu...Show More
Device Relevant Doped Amorphous Silicon Thin Films by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition
Boon Heng TEO;Jin LIU;Jia GE;Delio PEREZ;Edwin CARMONA;Maryknol DELOS SANTOS;Jennifer Jordan EPISTOLA;Thomas MUELLER
Hydrogenated doped silicon thin films deposited using Inductively Coupled Plasma Enhanced Chemical Vapour Deposition were investigated for their film characteristics. In particular, the dilution ratio (H2: SiH4) and trimethylborane dopant gas ratio (TMB: SiH4) were varied in order to analyze their effect on the degree of crystallinity and conductivity. μRaman Spectroscopy and 4-Point Probe techniq...Show More
IEEE Account
Purchase Details
Profile Information
Need Help?
- US & Canada: +1 800 678 4333
- Worldwide: +1 732 981 0060
- Contact & Support
- About IEEE Xplore
- Contact Us
- Help
- Accessibility
- Terms of Use
- Nondiscrimination Policy
- Sitemap
- Privacy & Opting Out of Cookies
A not-for-profit organization, IEEE is the world's largest technical professional organization dedicated to advancing technology for the benefit of humanity.
© Copyright 2025 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.