I. Introduction
Strain sensors are the most commonly used devices to measure local deformation and fatigue studies, characterization of structures and accurate measurement, indication and recording of force, pressure and displacements etc. The strain sensors electrical resistance changes in proportion to the amount of applied strain. The change in resistance in nickel, iron and copper with elongation was reported by Thomson first in 1856 [1]. Since then, the different types of strain gauges have been widely fabricated with metals and semiconductors. The relation between change in electrical resistance and applied strain is expressed in terms of Gauge Factor (GF). The strain sensitivity (GF) depends upon both the geometric term and fractional change in electrical resistivity . It is expressed as , where ϑ is the Poisson's ratio. The Poisson's ratio in case of metals varies from 0.2 to 0.42. Hence the GF for any metal normally is in the range of 1.4 to 2.1 [2]. The normalized change in resistivity for any metals with applied strain is negligible, whereas in case of semiconductors, it varies from 50 to 100 times than the geometric term [3]. But semiconductor strain gauges with nonlinear behavior are expensive, fragile and mostly suitable for very low strains.