I. Introduction
Ultra scaled Silicon based MOS device requires a smarter cooling system that can assure a longer life to the device but in some cases air cooling is not viable. Silicon Carbide (SiC) is a nostrum semiconductor material with wide energy band gap , for solid-state electronic devices at elevated temperature owing to its excellent electrical and mechanical properties. It gained enormous attraction because of its inherent material advantages e.g. high temperature, high power, high frequency, radiation hardened applications. The semiconductor devices are exposed to very high range of temperature variations when used in the area of space explorations, the geothermal and mining exploration, hybrid electric vehicles (HEV), nuclear power plant, aircraft industries, aeronautics application and industrial process control [1]–[2]. SiC based metal-semiconductor FET has become an advantageous technology for high-power microwave applications, such as the transmitters for the commercial and military communications [3]. SiC is prevailing wide band gap material with variety of features like high electric breakdown field (3.5 × 106 V/cm), high electron saturation drift velocity (2.0 × 107 cm/s), high melting point (2830 °C) and high thermal conductivity (4.9 W/cmK) [1].