I. Introduction
When electromagnetic field is emitted from integrated circuit (IC), the electromagnetic pattern of the near field can be detected using electromagnetic probes. Electromagnetic pattern obtained in near-field scanning over the surface of a device has attracted a lot of attention in the electromagnetic interference diagnosis for EMI source localization [1], EMI diagnosis [2], and immunity test [3]. The mechanism for the generation of the electromagnetic pattern is wave propagation, which is helpful to further understand the properties of waves inside ICs. How to pinpoint what the culprits are that cause such propagation especially for a device with complicated metal interconnect inside it being studied. The source localization method [4] based on the electromagnetic pattern is of general concern for IC design, and pattern clustering [5] could be helpful for the finding of the electromagnetic emission rule.