I. Introduction
Near-field measurement technique is promising for electromagnetic interference (EMI) diagnosis, assessment, and failure location in recent years [1], [2], [3], [4], [5], [6], [7], [8], [9], [10], with the trends of miniaturization and high frequency of electronic devices. The near-field probe based on the principle of electromagnetic induction is a simple, practical, and important tool for near-field diagnosis. There are several kinds of near-field probes, including vertical electric field (E-field) probe [11], [12], [13], [14], horizontal magnetic field (H-field) probe [14], [15], [16], and electromagnetic field (EM-field) probe [17], [18], [19], [20]. In 2019, a type of the EM-field probe (labeled as dual-probe) with a half unshielded loop structure is proposed by our team for simultaneous vertical E-field and horizontal H-field measurement at the same location [19]. It has the advantage of high efficiency in near-field detection and large scale mini-step near-field diagnosis and analysis.