Synchrotron radiation micro lithography and etching (SMILE) for MEMS fabrication

High aspect ratio microstructure technology (HARMST) is an important technology in order to realize 3-D MEMS. Fine scale HARMST enables processing on a sub-micron scale. If this process is made practicable, application of MEMS can be extended to the optical wavelength region. We are studying two approaches of HARMST using synchrotron radiation microlithography and etching (SMILE) techniques.