Application of SIMOX Technology for Parametric Correction of Resonant MEMS

The paper presents the results of theoretical studies of the application of hidden silicon oxide layers synthesized in MEMS elastic elements by SIMOX technology to compensate technological errors of these products arising at the early stages of the technological process. The advantages and disadvantages of the proposed method of parametric correction of the stiffness factor of the mechanical part of oscillating systems are analyzed. It is shown that the use of this technology allows to change the stiffness factor of some types of elastic elements within 20% of the design values.