New innovative etch technologies utilizing state-of-the-art atomic-level process for advanced patterning

In leading-edge semiconductor fabrications, atomic order controlled process such as Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE) are partly utilized, and its demands of application is expending. In this paper, we demonstrate some novel technologies of ALE to realize ultra-high selectivity, ALD for fine pitch Critical Dimension (CD) control, and ALD + etch to obtain vertical profile of contact holes. Those are promising techniques to meet requirements of the future device manufacturing.