Novel MWL μDBO pi-run Flow at Day 1 of RD Phase

Diffraction based overlay metrology (μDBO) is challenging at the very beginning of RD phase, because: 1) Manufacturing process is extremely new and unstable, which may hugely impact optical signal; 2) The schedule of pilot run (pi-run) lot is always tight, which only allows a few hours for overlay metrology set up. This requires overlay metrology have high robustness and short Time-to-Recipe. Based on this requirement, multi-wavelength (MWL)-based approaches have been rolled out to improve the robustness of μDBO. However, the traditional holistic metrology qualification (HMQ) recipe creation flow is still challenging to meet pilot run lot schedule. In order to catch the schedule, a fast MWL recipe creation flow is needed at day 1 of RD phase.