Fabrication of NaNbO3-(Ca0.5Sr0.5)ZrO3 antiferroelectric thin film by pulsed laser deposition

Antiferroelectric 0.94NaNbO
₃
-0.06(Ca
_0.5
Sr
_0.5
)ZrO
₃
films on (001) and (110) SrTiO
₃
single crystal substrates were successfully fabricated by a pulsed laser deposition method. Partial substitution of NaNbO
₃
with (Ca
_0.5
Sr
_0.5
)ZrO
₃
stabilized antiferroelectric phase of NaNbO
₃
. Especially, two types of domains, which c-axis of antiferroelectric orthorhombic phase grew along with in-plane and out-of-plane direction, were observed in the 0.94NaNbO
₃
-0.06(Ca
_0.5
Sr
_0.5
)ZrO
₃
film on (001) SrTiO
₃
substrate. It was suggested that these two domains contribute the exhibition of superb antiferroelectricity in the film.