Comparison of Multiple Methods for Obtaining P $\Omega$ Resistances With Low Uncertainties

Capabilities for high-resistance determinations are essential for calibration of currents below 1 pA, as typically requested in several applications, including semiconductor device characterization, single-electron transport, and ion beam technologies. This need to calibrate low currents warrants the expansion of accessible values of high resistance. We present several methods for measuring resistances on the PQ scale, namely potentiometry, dual-source bridge measurements, and teraohmmeter (TM) usage, all of which are subsequently compared to theoretical calculations. These methods were used to measure four 1-PQ resistances, one 10-PQ resistance, and one 100-PQ resistance, all generated by wye-delta (Y-A) networks containing three resistance elements. The differences between the experimentally obtained values and the theoretical values typically agree within 1% for 1-, 10-, and 100-PQ resistances and the measurement uncertainties for the three techniques were estimated to be between 0.4%-4.8% for 1 PQ, 2.8%-5.6% for 10 PQ, and 4.4%-10.2% for 100 PQ.