Design Driven Test Patterns for SMO OPC and SPA

Comprehensive test patterns are crucial to the development of new semiconductor technology. They play a key role in lithography such as source optimization, model calibration and mask optimization. This paper presents design driven test patterns generation principle and flow. The applications of test patterns on SMO (source and mask optimization) OPC (optical proximity correction) and SPA (scatting bar printing avoidance) were compared. The design driven test patterns can guide the design and technology optimization and predict layout printability performance according to the experiment results. And the cycle time of product development can be shorten effectively with the design driven test patterns.