The Characterization of Superconducting Tungsten Thin Films Deposited by DC Magnetron Sputtering

In this paper, we studied on the nanometer tungsten (W) thin films deposited onto Si
₃
N
₄
/SiO
₂
/Si substrates by DC magnetron sputtering. The morphologies, crystal structures and components of W thin films with different thicknesses were investigated. The four-terminal electrodes structure was prepared by microfabrication technology and the electrical and superconducting properties of W thin films were measured. All results show that the W thin films are mainly composed of β-W under our experimental growth conditions. The superconducting transition temperature (Tc) of the W thin film with different thickness fluctuates from 1.15K to 1.65K.