Model-based control in microelectronics manufacturing

In order to achieve process control systems in semiconductor manufacturing that are able to maximize yield at minimum cost, an integrated approach that combines advanced control techniques and mathematical modeling with available online measurements is necessary. We have utilized a model predictive control approach for multivariate run-to-run control of chemical mechanical planarization (CMP), lithography, and rapid thermal processing reactors. Improvements due to advanced control have been quantified in actual fab operations.