Effects of process parameters on structure and magnetic properties of sputtered Ni-Zn ferrite thin films

Ni-Zn ferrite thin films were prepared by RF magnetron sputtering at room temperature. The structure and magnetic properties of the as-deposited films were investigated as a function of oxygen partial pressure, working pressure and RF power. Deposition conditions greatly affect the crystallinity and magnetic properties of the Ni-Zn ferrite thin films. Ni-Zn ferrite thin films with spinel structure could be obtained by adjusting the process parameters without substrate heating or post heat treatment. The Ni-Zn ferrite thin film deposited with the optimized condition at room temperature showed saturation magnetization of 170 emu/cm/sup 3/ and coercivity of 35 Oe.