Extraction of a Metal Ion Beam from a Planar Magnetron Sputter Ion Source

Positive and negative ion beams are extracted from a plasma sputter type ion source with the planar magnetron sputtering target. A planar copper magnetron target excites plasma by 13.56 MHz RF power. The extraction electrode faces the target with a pair of permanent magnets to reduce arcing for negative ion extraction. Positive and negative ions are extracted from the ion source, and the performance was better than the source operated with cage-type sputtering target.