Y-Ba-Cu-O film deposition by metal organic chemical vapor deposition on buffered metal substrates

YBa/sub 2/Cu/sub 3/O/sub x/ (YBCO) films have been deposited on buffered metal substrates by metal organic chemical vapor deposition (MOCVD). Cube-textured nickel substrates were fabricated by a thermomechanical process, epitaxial CeO/sub 2/ films were deposited on these substrates by thermal evaporation. Nickel alloy substrates with biaxially-textured Yttria-Stabilized Zirconia (YSZ) buffer layers deposited by ion beam assisted deposition were also prepared. Highly biaxially textured YBCO films were deposited by MOCVD on both types of metal substrates. A critical current density greater than 105 A/cm/sup 2/ at 77 K has been achieved in YBCO films on metal substrates.