Nanoscale resistive Ni-Ti films obtained by magnetron sputtering

The paper considers the application of the method of magnetron sputtering from two sources for the controlled synthesis of nanoscale resistive Ni-Ti films. A description of the technological process of nanoscale Ni-Ti films production is given. Conditions for the films' receipt with high specific electrical surface resistivity and low temperature coefficient of resistance were defined. The research materials can serve as the basis for developing new resistive elements of measuring instruments (pressure, force, acceleration sensors, etc.) with improved technical characteristics, operating in conditions of high temperatures.